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Infographic: China's EUV lithography gap since 2004 has no viable solution for a decade (2014-2024+) due to export controls. Zeiss, core optics supplier, is rerouting supply chains from China to Japan, South Korea, and the US, with its Dresden, Germany hub investing and expanding. De-risking steps include reduced China risk, activated alternative nodes, built-in redundancy, and protected EUV access. DUV immersion stays at 193nm/~7nm resolution limit; no viable EUV for China in ~10+ years

CHIPS & AI · 09/09/2026

Zeiss Is Already Rerouting Around China’s Lithography Gap

UBS estimates that China's lithography technology is significantly behind, comparable to ASML in 2004, with no viable EUV alternative expected within a decade. However,…

4 MIN

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m1k.tech article cover: Blackwell B300 — The CoWoS Bottleneck, featuring an NVIDIA GPU with glowing green circuit traces

AI · 06/12/2026

NVIDIA’s Blackwell B300: The CoWoS Bottleneck Nobody Talks About

NVIDIA's B300 yields are stabilizing. That is not the story. The story is CoWoS: TSMC's packaging bottleneck that sits between Nvidia and the demand…

3 MIN

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Malaysia AI Chip Export Controls — The Phone in Your Pocket, article cover image from m1k.tech showing an Nvidia H100 chip with a warning symbol over a glowing map of Malaysia

CHIPS & AI · 07/16/2025

Malaysia AI Chip Export Controls and the Phone in Your Pocket

Malaysia's new 30-day permit window on H100-class accelerators is the part of the directive that actually changes procurement, and the same export coalition is…

11 MIN

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Zeiss Is Already Rerouting Around China’s Lithography Gap

NVIDIA’s Blackwell B300: The CoWoS Bottleneck Nobody Talks About

Malaysia AI Chip Export Controls and the Phone in Your Pocket

Signal over noise.